Please use this identifier to cite or link to this item: http://localhost:8080/xmlui/handle/123456789/15210
Title: High rate deposition of tin-doped indium oxide films by reactive magnetron
Authors: Miyamura A.etc., Ohno S., Kawaguchi Y.,
Issue Date: 2000
URI: http://localhost:8080/xmlui/handle/123456789/15210
Appears in Collections:530 Physics

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