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dc.contributor.authorMiyamura A.etc., Ohno S., Kawaguchi Y.,-
dc.date.accessioned2022-05-19T10:39:53Z-
dc.date.available2022-05-19T10:39:53Z-
dc.date.issued2000-
dc.identifier.urihttp://localhost:8080/xmlui/handle/123456789/15210-
dc.language.isoenen_US
dc.titleHigh rate deposition of tin-doped indium oxide films by reactive magnetronen_US
dc.typeBooken_US
Appears in Collections:530 Physics

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