Please use this identifier to cite or link to this item: http://localhost:8080/xmlui/handle/123456789/12304
Title: High rate deposition of tin-doped indium oxide films by reactive magnetron
Authors: S., Ohno
Y., Kawaguchi
A.etc., Miyamura
Issue Date: 2009
URI: http://localhost:8080/xmlui/handle/123456789/12304
Appears in Collections:0.1 Data Processing & Computer Science

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