Please use this identifier to cite or link to this item: http://localhost:8080/xmlui/handle/123456789/12304
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dc.contributor.authorS., Ohno-
dc.contributor.authorY., Kawaguchi-
dc.contributor.authorA.etc., Miyamura-
dc.date.accessioned2022-04-08T10:08:50Z-
dc.date.available2022-04-08T10:08:50Z-
dc.date.issued2009-
dc.identifier.urihttp://localhost:8080/xmlui/handle/123456789/12304-
dc.language.isoenen_US
dc.titleHigh rate deposition of tin-doped indium oxide films by reactive magnetronen_US
dc.typeBooken_US
Appears in Collections:0.1 Data Processing & Computer Science

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